Large area Multilayer Dielectric (MLD) diffraction gratings are essential components for temporal pulse compression in high energy laser systems. MLD grating designs typically consist of a silica grating layer on top of a dielectric multilayer reflector. A reactive ion beam etching (RIBE) process using a gridded radio frequency (RF) ion source was developed to uniformly etch the silica grating layer through a binary photo-resist mask on large size optics.
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