Chirped Pulse Amplification (CPA)

Chirped Pulse Amplification (CPA) is a technique for amplifying short laser pulses to extremely high peak power levels – up to 1 PetaWatt (PW) and beyond. CPA of laser pulses was first demonstrated at the University of Rochester’s Laboratory for Laser Energetics in 1985. It was invented to circumvent the limitation of optical amplifiers to withstand very high intensities of light, which effectively caps the intensity of an amplified short pulse. Learn More »

Spectral Beam Combining (SBC)

Spectral beam combining (SBC) offers an efficient and compact method to achieve extremely high cw laser powers. Many incoherent laser beams, each with a slightly different wavelength, are superimposed onto a single beam using a device with angular dispersion such as a prism or grating. The power in the resulting beam is the sum of the powers of the individual beams. Therefore this approach is said to offer a straightforward means of “power scaling.” Learn More »

Beam Steering and Focusing (BSF)

Diffraction gratings may be used for basic laser beam management functions, such as steering and focusing. As a simple example, by varying the period and orientation of the fringes across its aperture, a grating can perform point-to-point imaging just like a lens. Learn More »

Precision Positioning and Metrology (PPM)

Precision positioning and measurement require an accurate “ruler” and an equally accurate method to read the ruler. Until recently, the state-of-the-art for positioning and metrology with nanometer-level accuracy over relatively long distances has been the displacement measuring interferometer (DMI). An emerging alternative to DMIs is the precision heterodyne optical encoder system in which a two-dimensional (2D) grating, sometimes called a “grid plate,” replaces DMI stage mirrors as the reference reflection, thus enabling the interferometric sensor to remain in close proximity to the reference. Learn More »
Plymouth Grating Laboratory is dedicated to making the highest-quality diffraction gratings available today. Our focus is on lasers and laser systems. PGL gratings offer exceptionally high diffraction efficiency and laser damage threshold, combined with superior wavefront error and uniformity over large areas. This performance is made possible by PGL’s exclusive use of the Nanoruler, based on the proprietary Scanning Beam Interference Lithography technology developed at MIT, and PGL’s industry-leading process expertise. The company occupies 20,000 sq. ft. of dedicated manufacturing, engineering, and office space in Carver, MA, just outside of Plymouth, and about 45 miles south of Boston.

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