Optical Metrology

PGL firmly believes, “You can’t make what you can’t measure.” Our metrology infrastructure includes:

Scanning Electron Microscopy (SEM)
Optical microscopy
Optical interferometry (633 nm and 1054 nm)
Direct wavefront metrology (Shack Hartmann)
Flexible photometry (many different laser λ‘s)
Spectrophotometry
Semiautomated optical inspection
Numerous other commercial and home-built instruments

These are used for specification compliance verification in production as well as for process development and real-time diagnostics.

PGL’s Zygo Verifire™ Fizeau interferometer at 1053 nm for making very high resolution wavefront measurements (at spatial scales below 0.1 mm) over subapertures as large as 100 mm.

PGL’s 700 mm Fizeau interferometer for evaluation of the wavefront of substrates and diffraction gratings at 633 nm and 1054 nm. It uses a spatial-carrier static acquisition method (Zygo Flashphase™) to gather data at the camera frame rate, making the instrument insensitive to vibrations.

Measuring a thin-film coating with PGL’s Perkin Elmer spectrophotometer.

Diagram of a portion of PGL’s semiautomated inspection station that allows detailed mapping and microscopy of defects.

Plymouth Grating Laboratory is dedicated to making the highest-quality diffraction gratings available today. Our focus is on lasers and laser systems. PGL gratings offer exceptionally high diffraction efficiency and laser damage threshold, combined with superior wavefront error and uniformity over large areas. This performance is made possible by PGL’s exclusive use of the Nanoruler, based on the proprietary Scanning Beam Interference Lithography technology developed at MIT, and PGL’s industry-leading process expertise. The company occupies 20,000 sq. ft. of dedicated manufacturing, engineering, and office space in Carver, MA, just outside of Plymouth, and about 45 miles south of Boston.

5 Commerce Way, Carver, MA 02330, USA|+1.508.503.1719|sales@plymouthgrating.com