The Nanoruler

The Nanoruler 2 is PGL’s state-of-the-art grating patterning tool based on Scanning Beam Interference Lithography (SBIL). This patented technology was originally developed by Dr. Mark Schattenburg at MIT. PGL established the first commercial production system using SBIL to manufacture gratings that can be tailored to meet precise custom designs and specifications.

In the SBIL technique, fringes are exposed on photoresist with small phase-locked beams to pattern substrates on a scanning x-y stage using heterodyne phase reference interferometry to stabilize the fringes. Period repeatability is better than 10 ppb.

SBIL reduces structure defects and produces highly accurate linewidths resulting in excellent diffraction efficiency that is both uniform and repeatable from part-to-part. Gratings as large as 1 meter are possible, or batches of smaller gratings can be written efficiently in a single process step.

Schematic of the Nanoruler concept.
The Nanoruler can write gratings in different directions and with variable fringe periods and orientations.
A grating ready to be written on the Nanoruler.
Plymouth Grating Laboratory is dedicated to making the highest-quality diffraction gratings available today. Our focus is on lasers and laser systems. PGL gratings offer exceptionally high diffraction efficiency and laser damage threshold, combined with superior wavefront error and uniformity over large areas. This performance is made possible by PGL’s exclusive use of the Nanoruler, based on the proprietary Scanning Beam Interference Lithography technology developed at MIT, and PGL’s industry-leading process expertise. The company occupies 20,000 sq. ft. of dedicated manufacturing, engineering, and office space in Carver, MA, just outside of Plymouth, and about 45 miles south of Boston.

5 Commerce Way, Carver, MA 02330, USA|+1.508.503.1719|

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